Staff and Researcher Publications
Language
English
Publication Date
9-3-2024
Journal
ACS Omega
DOI
10.1021/acsomega.4c05535
PMID
39246471
PMCID
PMC11375697
PubMedCentral® Posted Date
8-20-2024
PubMedCentral® Full Text Version
Post-print
Abstract
This study focuses on the discovery of a single-component molecular resist for extreme ultraviolet (EUV) lithography by employing the ionizing radiation-induced decomposition of carbon–fluorine chemical bonds. The target material, DHP-L6, was synthesized by bonding perfluoroalkyl ether moieties to amorphous dendritic hexaphenol (DHP) with a high glass transition temperature. Upon exposure to EUV and electron beam irradiation, DHP-L6 films exhibited a decreasing solubility in fluorous developer media, resulting in negative-tone images. The underlying chemical mechanisms were elucidated by Fourier transform-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy, and nanoindentation experiments. These analyses highlighted the possible electron-induced decomposition of C–F bonds in DHP-L6, leading to molecular network formation via recombination of the resulting C-centered radicals. Subsequent high-resolution lithographic patterning under EUV irradiation showed that DHP-L6 could create stencil patterns with a line width of 26 nm at an exposure dose of 110 mJ cm–2. These results confirm that single-component small molecular compounds with fluoroalkyl moieties can be employed as patterning materials under ionizing radiation. Nonetheless, additional research is required to reduce the relatively high exposure energy for high-resolution patterning and to enhance the line-edge roughness of the produced stencil.
Published Open-Access
yes
Recommended Citation
Oh, Hyun-Taek; Kim, Gayoung; Jung, Seok-Heon; et al., "Solubility Change Behavior of Fluoroalkyl Ether-Tagged Dendritic Hexaphenol under Extreme UV Exposure" (2024). Staff and Researcher Publications. 63.
https://digitalcommons.library.tmc.edu/clinic_pub/63
Graphical Abstract
Included in
Medical Sciences Commons, Mental and Social Health Commons, Psychiatry and Psychology Commons